Future trends in microelectronics. journey into the unknown by Serge Luryi, Jimmy Xu, Alexander Zaslavsky

By Serge Luryi, Jimmy Xu, Alexander Zaslavsky

The e-book offers the longer term advancements and recommendations within the constructing box of microelectronics. The book’s chapters include contributions from numerous authors, all of whom are best pros affiliated both with best universities, significant semiconductor businesses, or govt laboratories, discussing the evolution in their career. a variety of microelectronic-related fields are tested, together with solid-state electronics, fabric technological know-how, optoelectronics, bioelectronics, and renewable energies. the themes lined diversity from basic actual rules, fabrics and equipment applied sciences, and significant new industry possibilities.

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SPIE 4226, 1–15 (2000). 5. R. Socha, X. Shi, and D. LeHoty, “Simultaneous source mask optimization (SMO),” Proc. SPIE 5853, 180–193 (2005). 6. J. Mulkens, P. Hinnen, M. Kubis, A. Padiy, and J. Benschop, “Holistic optimization architecture enabling sub-14-nm projection lithography,” J. Micro/Nanolith. MEMS MOEMS 13, 011006 (2014). 7. M. Dusa, J. Quaedackers, O. F. A. , “Pitch doubling through dual patterning lithography challenges in integration and litho budgets,” Proc. SPIE 6520, 65200G (2007).

Density multiplication and improved lithography by directed block copolymer assembly,” Science 321, 936–939 (2008). ❦ ❦ ❦ How Lithography Enables Moore’s Law ❦ 33 17. S. F. Wuister, D. Ambesi, T. S. , “Fundamental study of placement errors in directed self-assembly,” J. Micro/Nanolith. MEMS MOEMS 13, 033005 (2014). 18. H. Pathangi, B. T. Chan, H. , “Defect mitigation and root cause studies in 14 nm half-pitch chemoepitaxy directed self-assembly LiNe flow,” J. Micro/Nanolith. MEMS MOEMS 14, 031204 (2015).

Wuister, D. Ambesi, T. S. , “Fundamental study of placement errors in directed self-assembly,” J. Micro/Nanolith. MEMS MOEMS 13, 033005 (2014). 18. H. Pathangi, B. T. Chan, H. , “Defect mitigation and root cause studies in 14 nm half-pitch chemoepitaxy directed self-assembly LiNe flow,” J. Micro/Nanolith. MEMS MOEMS 14, 031204 (2015). 19. G. de Boer, M. P. Dansberg, R. , “MAPPER: Progress towards a high volume manufacturing system,” Proc. SPIE 8680, 86800O (2013). 20. E. Platzgummer, E. Klein, and H.

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